Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2001.07c
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- Pages.1533-1536
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- 2001
Growth of diamond films by RF-MW two step process
고주파-마이크로파 2단계 공정에 의한 다이아몬드 막의 성장
- Park, Sang-Hyun (Kyungnam University) ;
- Woo, Bog-Man (Kyungnam University) ;
- Park, Jae-Yoon (Kyungnam University) ;
- Lee, Sang-Hee (KITECH) ;
- Lee, Duk-Chul (Inha university)
- Published : 2001.07.18
Abstract
To grow the diamond films by using RF-MW two step process, at first, diamond seeds were deposited on silicon substrate by RF plasma CVD, and then a diamond layer grown by MW plasma CVD on the seeds. The grain-size of diamond films deposited by using RF-MW two step process was smaller and denser and also, crystallity of diamond film was better than those of the MW plasma CVD process. The deposited diamond films were analyzed by SEM(scanning electron microscophy), XRD (x-ray diffraction), and Raman spectroscopy.
Keywords