Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2001.07c
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- Pages.1512-1514
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- 2001
A Study on Etching Characteristics of PZT thin films in $CF_4/Cl_2/Ar$ High Density Plasma
$CF_4/Cl_2/Ar$ 고밀도 플라즈마를 이용한 PZT 박막의 식각 특성에 관한 연구
- Kang, Myoung-Gu (School of Electrical and Electronic Engineering, Chung-Ang University) ;
- Kim, Kyoung-Tae (School of Electrical and Electronic Engineering, Chung-Ang University) ;
- Kim, Tae-Hyung (Dept. of Electrical, Yeojoo institute of Technology) ;
- Kim, Chang-Il (School of Electrical and Electronic Engineering, Chung-Ang University)
- Published : 2001.07.18
Abstract
In this work, PZT thin films were etched as a function of
Keywords