Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2001.07c
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- Pages.1509-1511
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- 2001
Etching Characteristics of Polyimide Film as Interlayer Dielectric Using Inductively Coupled ($O_2/CF_4$ )Plasma
$O_2/CF_4$ 유도결합 플라즈마를 이용한 Polyimide 박막의 식각 특성
- Kang, Pil-Seung (School of Electronic and Electrical Engineering, Chung-Ang University) ;
- Kim, Chang-Il (School of Electronic and Electrical Engineering, Chung-Ang University)
- Published : 2001.07.18
Abstract
In this study, etching characteristics of polyimide(Pl) film with
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