FCVA 방법에 의해 제작된 DLC 박막의 질소 첨가에 따른 구조적, 전기적 물성분석

Characterization of structural and electrical properties of FCVA-produced DLC films as a function of nitrogen incorporation

  • 장석모 (한양대학교 전자전기제어계측 공학과) ;
  • 박창균 (한양대학교 전자전기제어계측 공학과) ;
  • 엄현석 (한양대학교 전자전기제어계측 공학과) ;
  • 박진석 (한양대학교 전자전기제어계측 공학과)
  • 발행 : 2001.07.18

초록

DLC films are deposited by using a modified FCVA system. Carbon amorphous network, surface roughness, internal compressive stress, resistivity, and Hall mobility are studied as a function of nitrogen flow rate (0 $\sim$ 10 sccm). As the nitrogen content is increased in the carbon network, the size of $sp^2$ clusters is increased, the internal compressive stress is decreased, and the resistivity is remarkably decreased. The RMS values of the surface roughness are measured to be in the range of 0.2$\sim$0.5nm. The Hall mobility of DLC film with 3 sccm of nitrogen added is 3.22 $cm^2/V{\cdot}$s.

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