Proceedings of the Korean Ceranic Society Conference (한국세라믹학회:학술대회논문집)
- 2000.04a
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- Pages.143.2-143.2
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- 2000
The Chemical Vapor Deposition Process of Alumina Thin Films by New Precursor and Liquid Delivery System and The Dependence of Oxidant Gases
새 전구체와 전구체 공급방법을 이용한 알루미나 박막의 화학기상증착공정 및 산화기체의 영향
- Published : 2000.04.21
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