Ferroelectric $SrBi_2Ta_2O_9$ Thin Films Deposited by Liquid Injection MOCVD Using Novel Bimetallic Alkoxide Precursor

  • Shin, Woong-Chul (Department of Materials Engineering, Chungnam National University) ;
  • Choi, Kyu-Jeong (Department of Materials Engineering, Chungnam National University) ;
  • Choi, Suck-Eun (Department of Materials Engineering, Chungnam National University) ;
  • Park, Chong-Man (Department of Materials Engineering, Chungnam National University) ;
  • Yoon, Soon-Gil (Department of Materials Engineering, Chungnam National University)
  • 발행 : 2000.04.21