RF 스퍼터링법에 의한 $(Sr_{0.85}Ca_{0.15})TiO_3$ 박막의 전압-전류 특성

V-I Characteristics of $(Sr_{0.85}Ca_{0.15})TiO_3$ Thin Film by RF Sputtering Method

The $(Sr_{0.85}Ca_{0.15})TiO_3$(SCT) thin films are deposited on Pt-coated electrode(Pt/TiN/$SiO_2$/Si) using RF sputtering method. The crystallinity of SCT thin films is increased with increase of substrate temperature in the temperature range of 200~500$[^{\circ}C]$. V-I characteristics of SCT thin films show the increasing leakage current with the increases of deposition temperature. The conduction mechanism of the SCT thin films observed in the temperature range of 25~100$[^{\circ}C]$ can be divided into four characteristic regions with different mechanism by the increasing current.