A STUDY ON THE ELECTRICAL PROPERTIES OF TIOxNy FILMS WITH CONTROLLED OXYGEN PARTIAL PRESSURE

  • Jung, Min J. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
  • Nam, Kyung H. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
  • Jung, Yun M. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
  • Boo, Jin H. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
  • Han, Jeon G. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University)
  • Published : 2000.11.01