Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2000.07a
- /
- Pages.612-615
- /
- 2000
Oxide etching characteristics and Etched Profiles by the Enhanced Inductive Coupled Plasma
산화막 식각에 적용된 E-ICP효과와 형상단면비교
Abstract
The etch rate of