Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Ion composition analysis of plasma sources for PSII

플라즈마 소스 이온주입용 플라즈마원의 이온 분석

  • Kim, G.H. (Appled Electrophysics Group, KERI) ;
  • Nikiforov, S.A. (Appled Electrophysics Group, KERI) ;
  • Lee, H.S. (Appled Electrophysics Group, KERI) ;
  • Rim, G.H. (Appled Electrophysics Group, KERI)
  • 김광훈 (한국전기연구소 전기물리연구그룹) ;
  • ;
  • 이홍식 (한국전기연구소 전기물리연구그룹) ;
  • 임근희 (한국전기연구소 전기물리연구그룹)
  • Published : 2000.07.17
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Abstract

A system to monitor the ion mass and charge-state as well as plasma potential value during plasma source ion implantation (PSII) has been developed. It was tested with 30-kV PI3D setup using alternatively hot cathode do (HC) and inductively coupled RF (ICP) discharge sources. The design and performance of the system will be described, and experimental results in nitrogen and argon plasmas produced by modular HC-ICP source will be discussed.

Keywords