Gas sensing characteristics of $LaFeO_3$ thick films

$LaFeO_3$ 후막의 가스 감지 특성

  • Kim, Jun-Gon (Dept. of Electricity and Electronic Eng., Gyeongsang National Univ.) ;
  • Ma, Tae-Young (Dept. of Electricity and Electronic Eng., Gyeongsang National Univ.) ;
  • Park, Ki-Cheol (Dept. of Electricity and Electronic Eng., Gyeongsang National Univ.) ;
  • Kim, Jeong-Gyoo (Dept. of Electricity and Electronic Eng., Gyeongsang National Univ.)
  • 김준곤 (경상대학교 전기전자공학부) ;
  • 마대영 (경상대학교 전기전자공학부) ;
  • 박기철 (경상대학교 전기전자공학부) ;
  • 김정규 (경상대학교 전기전자공학부)
  • Published : 2000.07.17

Abstract

The structural, electrical and gas sensing properties of $LaFeO_3$ thick films with different heat treatments were examined. As the heat treatment temperature increases, the intensity of dominant(121) phase increases in XRD measurements. Activation energy changes with the heat treatment and sensitivity is high for the samples with high activation energy, $LaFeO_3$ films showed high sensitivity to NO, $NH_3$ and $C_{4}H_{10}$ gases.

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