Application of Dielectric-loaded Cavity Resonators with HTS Endplates for Tunable High-Q Resonators and Characterization Tools for Large HTS Films

고온초전도 박막이 설치된 유전체부하 공진기의 주파수 조절 가능한 High-Q 공진기 제작 및 대면적 고온초전도 박막의 특성평가에의 응용

  • Kwon, Hyeong-Jun (Department of Physics and Center for Advanced Materials and Devices) ;
  • Park, Jong-Un (Department of Physics and Center for Advanced Materials and Devices) ;
  • Kang, Hun (Department of Physics and Center for Advanced Materials and Devices) ;
  • Hur, Jung (Department of Electronic Engineering Konkuk University) ;
  • Lee, Sang-Young (Department of Physics and Center for Advanced Materials and Devices)
  • 권형준 (건국대학교 물리학과, 신소재 및 소자연구센터) ;
  • 박종운 (건국대학교 물리학과, 신소재 및 소자연구센터) ;
  • 강훈 (건국대학교 물리학과, 신소재 및 소자연구센터) ;
  • 허정 (건국대학교 전자정보통신학과) ;
  • 이상영 (건국대학교 물리학과, 신소재 및 소자연구센터)
  • Published : 1999.08.18

Abstract

TE$_{01\;{\delta}}$ mode Cavity Resonators with a low loss dielectric rod and YBa$_2Cu_3O_{7-{\delta}}$ (YBCO) endplates were prepared and their microwave properties were studied at temperatures above 30 K. Both sapphire and rutile were used as the dielectrics. The TE$_{01\;{\delta}}$ mode Q$_0$ of the resonator, designed to work as a tunable resonator with variations in the gap distance (s) between the dielectric rod and the top YBCO, was more than 1000000 at s = 0 mm and at 30 K and .the resonant frequency of 19.56GHz when a sapphire rod was used for the dielectric. The TE$_2Cu_3O_{7-{\delta}}$ mode resonant frequency (f$_0$) appeared to decrease as the temperature is raised. Meanwhile, the temperature dependence of the TE$_2Cu_3O_{7-{\delta}}$ mode f$_0$ of the rutile-loaded resonator appeared different with f$_0$ increasing according to the temperature and Q$_0$ more than 300000 at 30 K and f$_0$ = 8.56 CHz. Comparisons were made between the microwave properties of the sapphire-loaded and the rutile-loaded resonators. Also, applications of the TE$_2Cu_3O_{7-{\delta}}$ mode cavity resonator for a tunable resonator with a very high Q$_0$ as · well as a characterization tool for surface resistance measurements of HTS films are described.

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