한국초전도학회:학술대회논문집

The Korean Superconductivity Society (한국초전도학회)
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Cylindrical Hollow Cathode Sputtering Deposition for Uniform Large Area YBCO Thin Film

균질한 대면적 YBCO 박막증착을 위한 실린더형 할로우 캐소드 스퍼터링 증착법

  • Suh, Jeong-Dae (Telecommunications Basic Research Laboratory, Electronics and Telecommunications Research Institute) ;
  • Han, Seok-Kil (Telecommunications Basic Research Laboratory, Electronics and Telecommunications Research Institute) ;
  • Sung, Gun-Yong (Telecommunications Basic Research Laboratory, Electronics and Telecommunications Research Institute) ;
  • Kang, Kwang-Yong (Telecommunications Basic Research Laboratory, Electronics and Telecommunications Research Institute)
  • 서정대 (한국전자통신연구원, 원천기술연구본부) ;
  • 한석길 (한국전자통신연구원, 원천기술연구본부) ;
  • 성건용 (한국전자통신연구원, 원천기술연구본부) ;
  • 강광용 (한국전자통신연구원, 원천기술연구본부)
  • Published : 1999.08.18
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Abstract

We have fabricated YBa$_2Cu_3O_{7-x}$ thin films by cylindrical hollow cathode sputtering. For 2 inch diameter of MgO (100) substrate, we obtained the zero resistance temperature in the range from 83 K to 86 K and thickness uniformity better than 5 % over the whole area. Also, the average deposition rate was 100nm/h which is higher than 10 times compare to conventional off-axis sputtering method. These results indicate that cylindrical hollow cathode sputtering seems to have unique capabilities for high rate and homogeneous deposition of large area thin film.

Keywords