대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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- Pages.867-869
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- 1999
$SF_6$ /Ar 가스 플라즈마에 의한 $SrBi_{2}Ta_{2}O_{9}$ 박막의 식각 메커니즘 연구
Study on mechanism for etching of $SrBi_{2}Ta_{2}O_{9}$ thin film in $SF_6$ /Ar gas plasma
- Kim, Dong-Pyo (School of Electrical and Electronic Engineering, Chung-Ang University) ;
- Seo, Jung-Woo (School of Electrical and Electronic Engineering, Chung-Ang University) ;
- Kim, Chang-Il (School of Electrical and Electronic Engineering, Chung-Ang University)
- 발행 : 1999.11.20
초록
In this study,
키워드