Crystallographic characteristics of ZnO thin films prepared by Facing Targets Sputtering system

대향타겟스퍼터링장치에의해 증착된 ZnO 박막의 결정학적 특성

  • 금민종 (경원대학교 전기전자공학부) ;
  • 성하윤 (경원대학교 전기전자공학부) ;
  • 공석현 (경원대학교 전기전자공학부) ;
  • 손인환 (신성대학 전기과) ;
  • 김경환 (경원대학교 전기전자공학부)
  • Published : 1999.11.20

Abstract

We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film's c-axis orientation and grain size were analyzed by XRD(x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.

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