한국표면공학회:학술대회논문집 (Proceedings of the Korean Institute of Surface Engineering Conference)
- 한국표면공학회 1999년도 추계학술발표회 초록집
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- Pages.59-59
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- 1999
DRY ETCHING CHARACTERISTICS OF INGAN USING INDUCTIVELY COUPLED $Cl_2/CHF_3,{\;}Cl_2/CH_4$ AND Cl_2/Ar PLASMAS.
- Lee, D.H. (Department of Materials Engineering, Sungkyunkwan University) ;
- Kim, H.S. (Department of Materials Engineering, Sungkyunkwan University) ;
- G.Y. Yeom (Department of Materials Engineering, Sungkyunkwan University) ;
- Lee, J.W. (Photonics Lab., Samsung Advanced Institute of Technology) ;
- Kim, T.I. (Photonics Lab., Samsung Advanced Institute of Technology)
- 발행 : 1999.10.01
초록
In this study, planer inductively coupled
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