Growth of vertically aligned carbon nanotubes on silicon substrates by the thermal CVD

열화학기상증착법에 의해 실리콘 기판위에 수직방향으로 정렬된 탄소나노튜브의 성장

  • 이철진 (군산대학교 전자공학과) ;
  • 김대운 (군산대학교 전자공학과) ;
  • 이태재 (군산대학교 전자공학과) ;
  • 박정훈 (군산대학교 전자공학과) ;
  • 손권희 (군산대학교 전자공학과) ;
  • 류승철 (군산대학교 전자공학과) ;
  • 최영철 (전북대학교 물리학과, 전북대학교 반도체과학기술대학원) ;
  • 박영수 (전북대학교 물리학과, 전북대학교 반도체과학기술대학원) ;
  • 최원석 (전북대학교 물리학과, 전북대학교 반도체과학기술대학원)
  • Published : 1999.06.01

Abstract

We have grown vertically aligned carbon nanotubes in a large area of Co-Ni codeposited Si substrates by the thermal CVD using $C_2$H$_2$gas. Since the discovery of carbon nanotubes, Synthesis of carbon nanotubes for mass production has been achieved by several methods such as laser vaporization, arc discharge, and pyrolysis. In particular, growth of vertically aligned nanotubes is of technological importance for applications to FED. Recently, vertically aligned carbon nanotubes have been grown on glass by PECVD. Aligned carbon nanotubes can be also grown on mesoporous silica and Fe patterned porous silicon using CVD. Despite such breakthroughs in the growth, the growth mechanism of the alignment are still far from being clearly understood. Furthermore, FED has not been clearly demonstrated yet at a practical level. Here, we demonstrate that carbon nanotubes can be vertically aligned on catalyzed Si substrate when the domain density reaches a certain value. We suggest that steric hindrance between nanotubes at an initial stage of the growth forces nanotubes to align vertically and then nanotubes are further grown by the cap growth mechanism.

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