Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1999.11a
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- Pages.150-150
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- 1999
Properties of flowable silicon dioxide by LPCVD using $SiH_4$ and $H_2O_2$
$H_2O_2$ 와 $SiH_4$ 를 이용한 LPCVD 유동 산화막의 특성
Abstract
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