Deposition Mechanism of $SrTiO_3$ Thin Films by Plasma Enhanced Metal Organic Chemical Vapor Deposition

플라즈마 MOCVD를 이용한 $SrTiO_3$ 박막 증착 메카니즘

  • Choi, R.J. (School of Chemical Engineering & Technology, Chonbuk National University) ;
  • Jeong, T. (School of Chemical Engineering & Technology, Chonbuk National University) ;
  • Hahn, Y B. (School of Chemical Engineering & Technology, Chonbuk National University) ;
  • Hong, J. (Samsung Semiconductors R &D Center)
  • 최락준 (전북대학교 화학공학부) ;
  • 정탁 (전북대학교 화학공학부) ;
  • 한윤봉 (전북대학교 화학공학부) ;
  • 홍진 (삼성반도체 연구소)
  • Published : 1999.11.01