Interface formation between $MgF_2$ and Si(111) studied by LEED, AES, and TPD

The phases and interface formation of MgF2 on Si(111) were studied by using LEED, AES, and TPD. When thick MgF2 film was deposited on the Si(111) surface at RT뭉 annealed at higher temperatures, a sequence of LEED patterns (no LEED pattern $\longrightarrow$1$\times$1$\longrightarrow$3$\times$1$\longrightarrow$7$\times$7) was observed. On the 1$\times$1 model in which Mg adsorbs on T4 site and F on H3 site could explain the simultaneous desorption of SiF2 and Mg. When thin MgF2 film was deposited, and initial $\alpha$-$\times$1 phase transforms to 3$\times$3 and $\beta$-1$\times$1 by thermal annealing with a slow evaporation of F and diffusion of Mg into the surface. the 3$\times$3 surface changes to ${\gamma}$-1$\times$1 by the selective desorptioon of F under e-beam irradiation and subsesquently to a Mg-induced {{{{ SQRT { 3} }}}} structure by annealing at $600^{\circ}C$.