Growth of Large Area $YBa_{2}$$Cu_{3}$ $O_{7-x}$Thin Films by Hollow Cathode Discharge Sputtering System

할로우 캐소드 방전 스퍼터링 시스템을 이용한 대면적 $YBa_{2}$$Cu_{3}$ $O_{7-x}$박막 성장

Superconducting $YBa_{2}$$Cu_{3}$ $O_{7-x}$(YBCO) thin films were deposited on MgO(100) substrates using a hollow cathode discharge sputtering system. Influence of the sputtering conditions such as substrate temperature and discharge sputtering gas pressure on electrical and structural properties were investigated. It was found that YBCO thin films with zero resistance temperature higher than 85 K were obtained to the pressure 200 mToorr(Ar/O2=0.9), substrate temperature of $760^{\circ}C$, and target-substrate distance of 10 mm during film deposition. Homogeneous large area YBCO films with 2 inch diameter were also sucessfully fabricated by this method.