한국조명전기설비학회:학술대회논문집 (Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference)
- 한국조명전기설비학회 1999년도 학술대회논문집-국제 전기방전 및 플라즈마 심포지엄 Proceedings of 1999 KIIEE Annual Conference-International Symposium of Electrical Discharge and Plasma
- /
- Pages.29-39
- /
- 1999
Dense Plasma Sources for Conventional and $PI_3$ Implanters
- S.A. Nikiforov (Efremov Research Institute of Electrophysical Apparatus(NIIEFA)) ;
- Lee, H.S. (Korea Electrotechnology Research Institute(KERI)) ;
- Kim, G.H. (Korea Electrotechnology Research Institute(KERI)) ;
- G.H. Rim (Korea Electrotechnology Research Institute(KERI))
- 발행 : 1999.11.01
초록
Both conventional and PI3 implanters require dense sources for high productivity rate, and small sheath expansion in PI3 besides. The problem of the creation of large volume uniform plasma in PI3 facilities replaces that of beam forming in accelerators. Some aspects of ion extraction in both cases and Langmuir probe plasma diagnostics with be discussed. Plasma parameters of large volume multicusp dc hot cathode and inductively coupled RF plasma sources obtained with Langmuir probe and ion mass analyzer with be presented. Design features and performances of high current Freeman and ECR ion sources will be described.
키워드