대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1999년도 하계학술대회 논문집 D
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- Pages.1919-1921
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- 1999
DC sputtering법을 이용한 Al/AlN/Si MIS capacitor 제작 및 수소첨가가 전기적 특성에 미치는 영향
Effect of hydrogen addition to use DC sputtering method on the electrical properties of Al/AlN/Si MIS capacitor fabrication
- Kim, Min-Suk (Myongji University) ;
- Kwon, Jung-Yul (Myongji University) ;
- Kim, Jee-Gyun (Myongji University) ;
- Lee, Heon-Yong (Myongji University) ;
- Lee, Hwan-Chul (Daejin University)
- 발행 : 1999.07.19
초록
AlN thin films were fabricated by sputter for the application of MIS device with Al/AlN/Si structure. We controled that sub-temperature room-temperature. Sputtering pressure 5 mTorr, flow ratio Ar:
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