A study on the controlling degree of crystallinity by controlling substrate temperature

기판온도 제어에 의한 PVDF 박막의 결정화도 제어에 관한 연구

  • Published : 1999.07.19

Abstract

PVDF(Polyvinylidene Fluoride) thin films were prepared by using a physical vapor deposition system. Thin films were studied by X-ray diffraction (XRD), differential scanning calorimeter (DSC). The melting point$(T_m)$ of PVDF thin films increases with increasing substrate temperature. It is found that the degree of crystallinity of PVDF thin films increases from 49.8 to 67% with increasing substrate temperature from 30 to $80^{\circ}C$.

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