Discharge Characteristics in Capacitively-Coupled Magnetron Sputtering System

용량 결합형 마그네트론 스퍼터링 장치의 방전 특성

  • Park, M.H. (Dept of Electrical and Computer Engineering) ;
  • Kwak, D.J. (Dept of Electrical and Computer Engineering)
  • 박명하 (경성대학교 전기전자컴퓨터 공학부) ;
  • 곽동주 (경성대학교 전기전자컴퓨터 공학부)
  • Published : 1999.07.19

Abstract

In order to study the fabricating condition of phosphor layers of thin film EL devices, some discharge characteristics with several targets in the parallel-plate magnetron sputtering system will be studied. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors of fabricating condition of thin film EL device.

Keywords