Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
권호 표지

Characterization of microstructures and electrical properties of insulating thin films deposited by PECVD and RF magnetron sputtering

화학기상증착 및 마그네트론 스퍼터링 방법으로 증착된 절연박막의 물성 분석 및 전기적 특성

  • Published : 1999.07.19
Download PDF
⟨ Previous Next ⟩

Abstract

Insulating thin films for strain gauge application, such as $SiO_2$ single layers and $SiO_2/Si_3N_4$ multilayers, are deposited by using both PECVD and RF magnetron sputtering techniques. Micro-structural analysis and electrical characterization are carried out on those films. It has been observed that PECVD films have a smoother surface and a denser micro-structure than sputter films. It should be also found out that the electrical insulation property of $SiO_2$ film can be significantly improved by adding the $Si_3N_4$ layer.

Keywords