Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Surface Properties of Plasma Nitrogen Ion Implanted Stainless Steel

플라즈마 질소 이온주입한 오스테나이트 스테인레스 강의 표면특성

  • Kim, G.H. (Appled Electrophysics Team, KERI) ;
  • Nikiforov, S.A. (Appled Electrophysics Team, KERI) ;
  • Lee, H.S. (Appled Electrophysics Team, KERI) ;
  • Rim, G.H. (Appled Electrophysics Team, KERI)
  • 김광훈 (한국전기연구소 전기물리연구팀) ;
  • ;
  • 이홍식 (한국전기연구소 전기물리연구팀) ;
  • 임근희 (한국전기연구소 전기물리연구팀)
  • Published : 1999.07.19
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Abstract

Plasma source ion implantation (PSII) is a non-line-of-sight technique for surface modification of materials which is effective for non-planar targets. Properties such as hardness, corrosion resistance, wear resistance and friction can be improved without affecting the bulk properties of the material. Type 304 austenitic stainless steel was treated by nitrogen plasma ion implantation at a target bias of -50kV. Surface properties, including microhardness and ion depth profile, were studied.

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