Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1998.11c
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- Pages.856-857
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- 1998
Study on characterization of hydrogenated carbon nitride thin films prebared by Plasma-Assisted Chemical Vapor Deposition
RF-PACVD를 이용한 Hydrogenated Carbon Nitride박막의 합성 및 특성에 관한 연구
- Lee, Chul-Hwa (Inha University) ;
- Kim, Byoung-Soo (Inha University) ;
- Park, Gu-Bum (Yuhan College) ;
- Lee, Sang-Hee (Inha University) ;
- Jin, Yoon-Young (Inha University) ;
- Lee, Duck-Chool (Inha University)
- Published : 1998.11.28
Abstract
Hydrogenated amorphous carbon nitride [a-C:H(N)] films were deposited on pretreated silicon(100) substrate in activated gas phase using. RF plasma-assisted CVD. We measured the FT-IR spectrum to investigate
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