대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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- Pages.770-772
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- 1998
유도 결합 플라즈마를 이용한 백금 박막의 식각시 $O_2$ 가스 첨가 효과
Effects of $O_2$ Gas Addition to Etching of Platinum Thin Film by Inductively Coupled Plasmas
- Kim, Nam-Hoon (Dept. of Electrical Engineering, Chung-Ang Univ.) ;
- Kim, Chang-Il (Dept. of Electrical Engineering, Chung-Ang Univ.) ;
- Kwon, Kwang-Ho (Dept. of Electronic Engineering, Han-Seo Univ.) ;
- Chang, Eui-Goo (Dept. of Electrical Engineering, Chung-Ang Univ.)
- 발행 : 1998.11.28
초록
The highest etch rate of Pt film was obtained at 10%
키워드