INDUCTIVELY COUPLED PLASMA (ICP) OXIDATION FOR LOW-TEMPERATURE POLY-Si THIN FILM TRANSISTORS

  • Park, Yong-Woo (Dept. of Materials Science and Engineering, KAIST, Taejon) ;
  • Ahn, Byung-Tae (Dept. of Materials Science and Engineering, KAIST, Taejon)
  • Published : 1998.08.01