EPITAXIAL GROWTH OF $CoSi_2$ ON SILICON OXIDE WHICH WAS CHEMICALLY GROWN ON Si(100).

  • Kim, Ki-Jo (Semiconductor Materials Laboratory, Division of Materials Science and Engineering Hanyang University) ;
  • Jeon, Hyeon-Tag (Semiconductor Materials Laboratory, Division of Materials Science and Engineering Hanyang University)
  • 발행 : 1998.08.01