ELECTRICAL PROPERTIES OF PZT THIN FILMS DEPOSITED ON Ir, TEX>$IrO<_2$ BOTTOM ELECTRODES BY REACTIVE SPUTTERING

  • Lee, H.S. (Dept. of Ceramic Eng., Ceramic Processing Research Center, Hanyang Univ.) ;
  • Shin, H.G. (Dept. of Ceramic Eng., Ceramic Processing Research Center, Hanyang Univ.) ;
  • Auh, K.H. (Dept. of Ceramic Eng., Ceramic Processing Research Center, Hanyang Univ.) ;
  • Kim, I.D. (Dept. of Mat., Sci. and Eng. KIAST) ;
  • Choi, W.Y. (Dept. of Mat., Sci. and Eng. KIAST) ;
  • Park, Y.J. (Dept. of Mat., Sci. and Eng. KIAST) ;
  • Hwang, K.T. (KITECH-KTL) ;
  • Um, W.S. (KITECH-KTL)
  • 발행 : 1998.08.01