Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.11a
- /
- Pages.36-36
- /
- 1998
Characteristics of plasma-enhanced chemical vapor deposited $SiO_2$ using $N_2O$ gas pre-treatment
$N_2O$ gas pre-treatment 효과에 의한 PECVD 산화막 특성
Abstract
Keywords