Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.05a
- /
- Pages.83-83
- /
- 1998
The Dielectric Stability of Fluorinated Silicon Oxide Films by $SiH_4$ Addition
$SiH_4$ 첨가에 의한 저유전율 SiOF 박막의 유전 특성 안정화
Abstract
Keywords