Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 1998.10a
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- Pages.573-576
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- 1998
A Numerical Analysis on the Development of ICP Source for Large Area LCD
대면적 LCD용 ICP소스에 대한 수치 해석적 분석
Abstract
In this paper, we analyzed electric field density and plasma condition to ICP reactor geometry structure, to generate plasma, to maintain plasma uniformity of large area LCD panel in ICP reactor also, we simulated electric field density for all kind existence current (antena and plasma current) in ICP reactor to analyze plasma antena structure
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