Surface and interfacial behavior during the crystallization of a-Si:H films deposited by DC-Saddle Field CVD; An in-situ Synchrotron X-ray Scattering study

  • Jeon, S.H. (Department of Materials Science and Engineering, and Center for Electronic Materials Research, Kwangju Institute of Science and Technology) ;
  • Kim, H.J. (Department of Materials Science and Engineering, and Center for Electronic Materials Research, Kwangju Institute of Science and Technology) ;
  • Noh, D.Y. (Department of Materials Science and Engineering, and Center for Electronic Materials Research, Kwangju Institute of Science and Technology)
  • Published : 1998.06.01