A Study on the Diamond thin film synthesized by Microwave Plasma Enhanced Chemical Vapor Deposition

마이크로웨이브 화학기상성장법을 이용한 다이아몬드 박막의 합성에 관한 연구

  • Published : 1998.07.20

Abstract

The methastable state diamond films have been deposited on Si substrates using MWPCVD. Effects of each experimental parameters of MWPCVD including $CH_4$ conentrations, Oxygen additions, Operating pressure, etc. on the growth rate and crystallinity were invesitigated. The best crystallinity of the film at 3% methane concentration addition of oxygen to the $CH_4-H_2O$ mixture gave an improved film crystallinity at 50% oxygen concentration. Upon increasing the operating pressure, the growth rate and crystallinity were increased simultaneously.

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