A Study on Discharge Electrode Formation for PDP with Ion Beam Assisted DC Planar Magnetron Sputtering Device

Ion Beam Assisted DC Planar Magnetron Sputtering 장치에 의한 PDP용 방전전극 형성에 관한 연구

  • Kim, J.H. (Dept. of Electrical Eng. Pusan National University) ;
  • Son, J.B. (Dept. of Electrical Eng. Pusan National University) ;
  • Shin, J.H. (Dept. of Electrical Eng. Pusan National University) ;
  • Cho, J.S. (Dept. of Electrical Eng. Pusan National University) ;
  • Park, C.H. (Dept. of Electrical Eng. Pusan National University)
  • Published : 1998.07.20

Abstract

The thin film metal electrode for PDP needs low resistivity and strong adhesion. But the sputtered copper film is weak, in the adhesion between copper and glass. In this paper, we investigated the characteristics of resistivity and adhesion about Cu thin film using Ion Beam Assisted DC Planar Magnetron Sputtering(DCPM) Device.

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