Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1997.11a
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- Pages.364-366
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- 1997
The characteristics of helical resonator plasma
헬리컬 공명 플라즈마의 특성
- Jang, Sang-Hun (Dep. of Electrical Eng. Kyungpook National University) ;
- Kim, Tae-Hyun (Dep. of Electrical Eng. Kyungpook National University) ;
- Kim, Moon-Young (Dep. of Electrical Eng. Kyungpook National University) ;
- Tae, Heung-Sik (Dep. of Electrical Eng. Kyungpook National University)
- Published : 1997.11.29
Abstract
An experimental helical resonator plasma system that can be applied to the next generation semiconductor processing was fabricated and its characteristics was investigated. Helical resonator plasma can operate both in a capacitive and an inductive mode. Such sources will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. Plasma parameters were measured with Double Langmuir Probes. Plasma densities of
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