한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

Microwave Plasma CVD에 의한 Diamond 박막의 성장

The Study on Growls of diamond thin films Synthesized by Microwave Plasma Enhanced Chemical Vapor Deposition

  • 이병수 (인하대학교 공대 전기공학과) ;
  • 이상희 (인하대학교 공대 전기공학과) ;
  • 박구범 (유한전문대학 전기과) ;
  • 박종관 (유한전문대학 정보통신과) ;
  • 박상현 (경남대학교 공대 전기공학과) ;
  • 유도현 (안산공업전문대학 전기과) ;
  • 이덕출 (인하대학교 공대 전기공학과)
  • 발행 : 1997.11.01
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초록

Diamond thin films were deposited on P-type(100) Si wafers using MPECVD. Prior to deposition, mechanical scretching was done to improve density of nucleation sites with diamond paste of 0.25${\mu}{\textrm}{m}$ size. Diamond films were deposited under the following conditions : methane concentration of 0.5~5%, oxygen concentration of 0~70%, process pressure of 70Torr, process temperature of 900~95$0^{\circ}C$, and deposition time 5hrs. The changes of the morphology and the growth rates of the deposits with the experimental conditions are expriend by Scanning Electron Microscopy. Raman Spectroscopy and X-ray Diffraction method.

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