한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

RF Sputtering법에 의한 (Ba,Sr)TiO$_3$ 세라믹 박막의 구조적 특성에 관한 연구

A study on the structural properties of (Ba,Sr)TiO$_3$ Ceramics Thin Films by RF Sputtering Technique

  • 신승창 (광운대학교 전자재료공학과) ;
  • 정장호 (광운대학교 전자재료공학과) ;
  • 배선기 (인천대학교 전기공학과) ;
  • 이영희 (광운대학교 전자재료공학과)
  • 발행 : 1997.11.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

(Ba,Sr)TiO$_3$ thin film capacitors were prepared on SiO$_3$/Si(100)wafer by RF sputtering technique. The structural and crystallographic properties were studied with deposition conditions and annealing temperatures. Microstructural properties of (Ba,Sr)TiO$_3$ thin films were investigated by the SEM, XRD. The thickness and grain size were studied for the varying of RF power and temperature.

키워드