Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1997.04a
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- Pages.23-26
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- 1997
TMAH/IPA Anisotropic Etching Characteristics with Addition of Pyrazine
Pyrazine이 첨가된 TMAH/IPA 이방성 식각특성
Abstract
This work presents the TMAH/IPA anisotropic etching characteristics with addition of Pyrazine. (100) Si etching rate of 0.747
Keywords