Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1997.10a
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- Pages.104-104
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- 1997
Etch characteristics of GaN using inductively coupled ${Cl}_{2}/{BCl}_{3}$ plasmas
${Cl}_{2}/{BCl}_{3}$ 유도 결함형 플라즈마를 이용한 GaN 식각 특성
Abstract
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