Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1997.07a
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- Pages.114-114
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- 1997
Cu film growth on Si substrate by combining plasma enhanced chemical vapor deposition with partially ionized beam deposition
Ion Beam Assisted Depposition법에 의한 TiN 박막 제작 및 특성연구
- Kim, K.H. (Division of Ceramics, Korea Institute of Science and Technology, pp.O. Box 131 Chengryang, Seoul, 130-650 Korea) ;
- Park, S.C. (Division of Ceramics, Korea Institute of Science and Technology, pp.O. Box 131 Chengryang, Seoul, 130-650 Korea) ;
- Park, G.J. (Deppartment of Ceramic Engineering, Yonsei University.) ;
- Park, G.J. (Division of Chemical Engineering, Korea Insitute of Science and Technology, pp.O. Box 131 Chengryang, ) ;
- Jung H.J. (Division of Chemical Engineering, Korea Insitute of Science and Technology, pp.O. Box 131 Chengryang, ) ;
- Koh S.K. (Division of Ceramics, Korea Institute of Science and Technology, pp.O. Box 131 Chengryang, Seoul, 130-650 Korea)
- Published : 1997.07.01
Abstract
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