Influence of $CCl_4$ on GaAs surface morphology during the AP-MOCVD GaAs growth

  • Jun, Sung-Won (Semiconductor Materials Research Center, Division of Electronics and Information Technology, KIST) ;
  • Min, B.-D. (Semiconductor Materials Research Center, Division of Electronics and Information Technology, KIST) ;
  • Kim, Y. (Semiconductor Materials Research Center, Division of Electronics and Information Technology, KIST) ;
  • Kim, E.K. (Semiconductor Materials Research Center, Division of Electronics and Information Technology, KIST) ;
  • Min, S.-K. (Semiconductor Materials Research Center, Division of Electronics and Information Technology, KIST) ;
  • Seong, T.-Y. (Department of Materials Science and Engineering, K-JIST)
  • Published : 1997.07.01