한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1997년도 제12회 학술발표회 논문개요집
- /
- Pages.70-70
- /
- 1997
In Situ Dry Etching pprocesses for Moly Multi-Layers with application to the Reduced Process-Less Mask TFT
- Hong, Hong-Munppyo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Kim, Kim-Sanggab (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Yu, Yu-Chungi (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Cho, Cho-Seongyun (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Kim, Kim-Jangsoo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Kim, Kim-Chiwoo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Yang, Yang-Honggun (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Souk, Joon-Yung (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900)
- 발행 : 1997.02.01