대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1997년도 하계학술대회 논문집 C
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- Pages.1364-1366
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- 1997
자화된 평판형 유도 결합 플라즈마의 특성 및 건식 식각에의 응용
The Characteristics of Magnetized Planar type Inductively Coupled Plasma and its Application to a Dry Etching Process
- Lee, Soo-Boo (school of Electrical and computer Engineering, Inha University) ;
- Park, Hun-Gun (school of Electrical and computer Engineering, Inha University) ;
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Lee, Seok-Hyun
(school of Electrical and computer Engineering, Inha University)
- 발행 : 1997.07.21
초록
Planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.
키워드