Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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The Characteristics of Magnetized Planar type Inductively Coupled Plasma and its Application to a Dry Etching Process

자화된 평판형 유도 결합 플라즈마의 특성 및 건식 식각에의 응용

  • Lee, Soo-Boo (school of Electrical and computer Engineering, Inha University) ;
  • Park, Hun-Gun (school of Electrical and computer Engineering, Inha University) ;
  • Lee, Seok-Hyun (school of Electrical and computer Engineering, Inha University)
  • 이수부 (인하대학교 공과대학 전자.전기.컴퓨터 공학부) ;
  • 박헌건 (인하대학교 공과대학 전자.전기.컴퓨터 공학부) ;
  • 이석현 (인하대학교 공과대학 전자.전기.컴퓨터 공학부)
  • Published : 1997.07.21
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Abstract

Planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.

Keywords