Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1997.07d
- /
- Pages.1364-1366
- /
- 1997
The Characteristics of Magnetized Planar type Inductively Coupled Plasma and its Application to a Dry Etching Process
자화된 평판형 유도 결합 플라즈마의 특성 및 건식 식각에의 응용
- Lee, Soo-Boo (school of Electrical and computer Engineering, Inha University) ;
- Park, Hun-Gun (school of Electrical and computer Engineering, Inha University) ;
- Lee, Seok-Hyun (school of Electrical and computer Engineering, Inha University)
- Published : 1997.07.21
Abstract
Planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.
Keywords