Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1996.11a
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- Pages.200-202
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- 1996
A Study on the Characteristics of the MgO Thin Film Deposited by the Hollow Cathode Discharge Ion Plating Method
HCD 이온 플레이팅법에 의해 증착된 MgO박막의 특성에 관한 연구
- Chung, Woo-Joon (Dep. of Electrical Engineering, seoul National University) ;
- Jeong, Heui-Seob (Dep. of Electrical Engineering, seoul National University) ;
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Whang, Ki-Woong
(Dep. of Electrical Engineering, seoul National University)
- Published : 1996.11.16
Abstract
MgO film was deposited on the glass substrate by the hollow cathode discharge ion plating method and the characteristics of the MgO thin film such as deposition rate, crystalline orientation, surface morphology and secondary electron coefficient were investigated. The deposition rate of MgO thin films were
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