Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 1996.11a
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- Pages.725-730
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- 1996
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- 2005-8446(pISSN)
Surface Micromachining of TEOS Sacrificial Layers by HF Gas Phase Etching
HF 기상식각에 의한 TEOS 희생층의 표면 미세가공
Abstract
The key process in silicon surface micromachining is the selective etching of a sacrificial layer to release the silicon microstructure. The newly developed anhydrous HF/
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